Invention Grant
US09177776B2 Mass to charge ratio selective ejection from ion guide having supplemental RF voltage applied thereto
有权
离子导向器的质荷比选择性喷射具有施加到其上的补充RF电压
- Patent Title: Mass to charge ratio selective ejection from ion guide having supplemental RF voltage applied thereto
- Patent Title (中): 离子导向器的质荷比选择性喷射具有施加到其上的补充RF电压
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Application No.: US13522888Application Date: 2011-01-18
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Publication No.: US09177776B2Publication Date: 2015-11-03
- Inventor: John Brian Hoyes , Daniel James Kenny , David Langridge
- Applicant: John Brian Hoyes , Daniel James Kenny , David Langridge
- Applicant Address: GB Wilmslow
- Assignee: Micromass UK Limited
- Current Assignee: Micromass UK Limited
- Current Assignee Address: GB Wilmslow
- Agency: Diederiks & Whitelaw, PLC
- Priority: GB1000852.2 20100119
- International Application: PCT/GB2011/050073 WO 20110118
- International Announcement: WO2011/089419 WO 20110728
- Main IPC: H01J49/34
- IPC: H01J49/34 ; H01J49/06 ; H01J49/42

Abstract:
An ion guide is disclosed wherein an axial DC voltage barrier is created at the exit of the ion guide. A primary RF voltage is applied to the electrodes in order to confine ions radially within the ion guide. A supplemental RF voltage is also applied to the electrodes. The supplemental RF voltage has a greater axial repeat length than that of the primary RF voltage. The amplitude of the supplemental RF voltage is increased with time causing ions to become unstable and gain sufficient axial kinetic energy such that the ions overcome the axial DC voltage barrier. Ions emerge axially from the ion guide in mass to charge ratio order.
Public/Granted literature
- US20130099110A1 Mass to Charge Ratio Selective Ejection from Ion Guide Having Supplemental RF Voltage Applied Thereto Public/Granted day:2013-04-25
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