Invention Grant
- Patent Title: Plasma source for charged particle beam system
- Patent Title (中): 带电粒子束系统的等离子体源
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Application No.: US13353032Application Date: 2012-01-18
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Publication No.: US09196451B2Publication Date: 2015-11-24
- Inventor: Shouyin Zhang , Noel Smith , Walter Skoczylas
- Applicant: Shouyin Zhang , Noel Smith , Walter Skoczylas
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg; John E. Hillert
- Main IPC: H01J27/00
- IPC: H01J27/00 ; H01J37/08 ; H01J27/16

Abstract:
An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.
Public/Granted literature
- US20120280136A1 Plasma Source for Charged Particle Beam System Public/Granted day:2012-11-08
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