Invention Grant
- Patent Title: Pattern dimension measurement method and charged particle beam microscope used in same
- Patent Title (中): 图案尺寸测量方法和使用的带电粒子束显微镜
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Application No.: US13504129Application Date: 2010-09-30
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Publication No.: US09200896B2Publication Date: 2015-12-01
- Inventor: Keiichiro Hitomi , Yoshinori Nakayama , Junichi Tanaka
- Applicant: Keiichiro Hitomi , Yoshinori Nakayama , Junichi Tanaka
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge PC
- Priority: JP2009-246627 20091027
- International Application: PCT/JP2010/067107 WO 20100930
- International Announcement: WO2011/052339 WO 20110505
- Main IPC: H04N9/47
- IPC: H04N9/47 ; H04N7/18 ; G01B15/00 ; H01J37/28

Abstract:
In order to provide a pattern dimension measurement method with a small measured error and excellent reproducibility even though defocus occurs and a charged particle beam microscope used in the same, in a method for applying a charged particle beam to a specimen formed with a pattern to measure a pattern dimension from a signal intensity distribution of signal charged particles from the specimen, edge index positions (X1) and (X2) on the right and left of the maximum point of signal intensity corresponding to a pattern edge are calculated by a threshold method, and a pattern edge position (Xe) is found from a mean value between the positions. Thus, it is possible to reduce the influence of defocus on the pattern edge position (Xe).
Public/Granted literature
- US20120212602A1 PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM MICROSCOPE USED IN SAME Public/Granted day:2012-08-23
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