Invention Grant
US09200896B2 Pattern dimension measurement method and charged particle beam microscope used in same 有权
图案尺寸测量方法和使用的带电粒子束显微镜

Pattern dimension measurement method and charged particle beam microscope used in same
Abstract:
In order to provide a pattern dimension measurement method with a small measured error and excellent reproducibility even though defocus occurs and a charged particle beam microscope used in the same, in a method for applying a charged particle beam to a specimen formed with a pattern to measure a pattern dimension from a signal intensity distribution of signal charged particles from the specimen, edge index positions (X1) and (X2) on the right and left of the maximum point of signal intensity corresponding to a pattern edge are calculated by a threshold method, and a pattern edge position (Xe) is found from a mean value between the positions. Thus, it is possible to reduce the influence of defocus on the pattern edge position (Xe).
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