Invention Grant
US09206307B2 Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
有权
含有相分离结构的结构的制造方法,形成图案的方法和形成精细图案的方法
- Patent Title: Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
- Patent Title (中): 含有相分离结构的结构的制造方法,形成图案的方法和形成精细图案的方法
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Application No.: US14447376Application Date: 2014-07-30
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Publication No.: US09206307B2Publication Date: 2015-12-08
- Inventor: Tasuku Matsumiya , Takehiro Seshimo , Ken Miyagi , Takaya Maehashi , Takahiro Dazai , Yoshiyuki Utsumi
- Applicant: Tokyo Ohka Kogyo Co., Ltd.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2013-159898 20130731
- Main IPC: B05D3/10
- IPC: B05D3/10 ; B44C1/22 ; C08L53/00 ; B82B3/00 ; C09D153/00 ; B05D1/18

Abstract:
A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the PA block and PB block being mutually bonded in the block copolymer, and the PB block including a structural unit other than a structural unit constituting the PA block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block, a coordinate point B of the PB block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.
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