Invention Grant
US09206307B2 Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern 有权
含有相分离结构的结构的制造方法,形成图案的方法和形成精细图案的方法

Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
Abstract:
A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the PA block and PB block being mutually bonded in the block copolymer, and the PB block including a structural unit other than a structural unit constituting the PA block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block, a coordinate point B of the PB block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.
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