Invention Grant
- Patent Title: Method for manufacturing micro structure using X-ray exposure
- Patent Title (中): 使用X射线曝光制造微结构的方法
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Application No.: US13128016Application Date: 2009-11-02
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Publication No.: US09217927B2Publication Date: 2015-12-22
- Inventor: Bong-Kee Lee , Dong Sung Kim , Tai-Hun Kwon
- Applicant: Bong-Kee Lee , Dong Sung Kim , Tai-Hun Kwon , Young Ok Lee
- Applicant Address: KR Pohang
- Assignee: POSTECH ACADEMY-INDUSTRY FOUNDATION
- Current Assignee: POSTECH ACADEMY-INDUSTRY FOUNDATION
- Current Assignee Address: KR Pohang
- Agency: Lex IP Meister, PLLC
- Priority: KR10-2008-0110582 20081107
- International Application: PCT/KR2009/006385 WO 20091102
- International Announcement: WO2010/053277 WO 20100514
- Main IPC: G03F7/20
- IPC: G03F7/20 ; B81C99/00 ; G03F7/00
Abstract:
Provided is a method for fabricating a microstructure. The method includes disposing an X-ray mask on photosensitive material and exposing the photosensitive material by radiating X-rays to the photosensitive material, etching the exposed photosensitive material, forming a mold having a micro-pattern by filing the etched photosensitive material with metal, forming a mold module by combining a plurality of molds, and forming a microstructure using the mold module.
Public/Granted literature
- US20110254195A1 METHOD FOR MANUFACTURING MICRO STRUCTURE USING X-RAY EXPOSURE Public/Granted day:2011-10-20
Information query
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