Invention Grant
- Patent Title: Plasma generator
- Patent Title (中): 等离子发生器
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Application No.: US14348062Application Date: 2012-09-28
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Publication No.: US09224580B2Publication Date: 2015-12-29
- Inventor: Marc Smits , Chris Franciscus Jessica Lodewijk
- Applicant: MAPPER LITHOGRAPHY IP B.V.
- Applicant Address: NL Delft
- Assignee: MAPPER LITOHGRAPHY IP B.V.
- Current Assignee: MAPPER LITOHGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Rock Monegier LLP
- Agent David P. Owen
- International Application: PCT/EP2012/069226 WO 20120928
- International Announcement: WO2013/045636 WO 20130404
- Main IPC: H01J37/10
- IPC: H01J37/10 ; H01J37/32 ; H05H1/30 ; H05H1/46 ; H01J37/30

Abstract:
An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) comprising a primary source chamber (15) and a first coil (4) for generating plasma in the primary source chamber, a secondary plasma source (25) comprising a secondary source chamber (16) and a second coil (26) for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet (14) for emitting at least a portion of the plasma generated by the arrangement.
Public/Granted literature
- US20140231667A1 PLASMA GENERATOR Public/Granted day:2014-08-21
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