Invention Grant
US09229331B2 EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method
有权
EUV镜包括具有稳定组成的氧氮化物覆盖层，EUV光刻设备和操作方法
- Patent Title: EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method
- Patent Title (中): EUV镜包括具有稳定组成的氧氮化物覆盖层，EUV光刻设备和操作方法
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Application No.: US14227784Application Date: 2014-03-27
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Publication No.: US09229331B2Publication Date: 2016-01-05
- Inventor: Gisela von Blanckenhagen , Dirk Heinrich Ehm
- Applicant: CARL ZEISS SMT GMBH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Edell, Shapiro & Finnan, LLC
- Priority: DE102011083462 20110927
- Main IPC: G03B27/70
- IPC: G03B27/70 ; G02B5/08 ; G03F7/20 ; G21K1/06 ; C23C16/30 ; B82Y10/00 ; F21V9/04 ; F21V9/06 ; G02B5/20 ; B05D3/06
Abstract:
A mirror (13) for use e.g. in an EUV lithography apparatus or an EUV mask metrology system, with: a substrate (15) and a coating (16) reflective to EUV radiation (6), the reflective coating having a capping layer (18) composed of an oxynitride, in particular composed of SiNxOY, wherein a nitrogen proportion x in the oxynitride NxOY is between 0.4 and 1.4. Also provided are an EUV lithography apparatus having at least one such EUV mirror (13) and a method for operating such an EUV lithography apparatus.
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