Invention Grant
- Patent Title: High performance electrical circuit structure
- Patent Title (中): 高性能电路结构
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Application No.: US13879783Application Date: 2011-10-18
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Publication No.: US09232654B2Publication Date: 2016-01-05
- Inventor: James Rathburn
- Applicant: James Rathburn
- Applicant Address: US MN Maple Grove
- Assignee: HSIO Technologies, LLC
- Current Assignee: HSIO Technologies, LLC
- Current Assignee Address: US MN Maple Grove
- Agent Karl Schwappach
- International Application: PCT/US2011/056664 WO 20111018
- International Announcement: WO2012/061008 WO 20120510
- Main IPC: H05K1/00
- IPC: H05K1/00 ; H05K1/18 ; H01L23/538 ; H05K3/32 ; H05K3/40 ; H05K3/46 ; H05K1/11 ; H05K1/16 ; H05K3/12 ; H05K3/30 ; H01L23/498 ; H05K1/02

Abstract:
A high performance electrical interconnect adapted to provide an interface between terminals on first and second circuit members. The electrical interconnect includes a first circuitry layer with a first surface and a second surface having a plurality of contact pads adapted to electrically coupled with the terminals on the first circuit member. At least one dielectric layer is printed on the first surface of the first circuitry layer. The dielectric layer includes a plurality recesses. A conductive material is deposited in at least a portion of the recesses to create circuit geometry electrically coupled with the first circuitry layer. A second circuitry layer includes a first surface a plurality of contact pads adapted to electrically couple with the terminals on the second circuit member and a second surface attached to the dielectric layers. The circuit geometry electrically couples the first circuitry layer to the second circuitry layer.
Public/Granted literature
- US20130223034A1 HIGH PERFORMANCE ELECTRICAL CIRCUIT STRUCTURE Public/Granted day:2013-08-29
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