Invention Grant
- Patent Title: Optical air slit and method for manufacturing optical air slits
- Patent Title (中): 光学气隙及其制造方法
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Application No.: US14444294Application Date: 2014-07-28
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Publication No.: US09235115B2Publication Date: 2016-01-12
- Inventor: Arturo L. Caigoy
- Applicant: RAYTHEON COMPANY
- Applicant Address: US MA Waltham
- Assignee: RAYTHEON COMPANY
- Current Assignee: RAYTHEON COMPANY
- Current Assignee Address: US MA Waltham
- Agency: Daly, Crowley, Mofford & Durkee, LLP
- Main IPC: B29D11/00
- IPC: B29D11/00 ; G03F7/00 ; G02B5/00 ; G03F7/40 ; G03F7/20 ; G01J3/02
Abstract:
A structure having an optical slit therein. The structure includes a substrate having an opening therethrough and a metal layer disposed on the substrate, such metal layer having a photolithographically formed slit therein, such slit being narrower than the opening and being disposed over the opening, portions of the metal layer disposed adjacent the slit being suspended over the opening and other portions of the metal layer being supported by the substrate.
Public/Granted literature
- US20140335458A1 OPTICAL AIR SLIT AND METHOD FOR MANUFACTURING OPTICAL AIR SLITS Public/Granted day:2014-11-13
Information query
