Invention Grant
- Patent Title: Ellipsometer focusing system
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Application No.: US14046558Application Date: 2013-10-04
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Publication No.: US09243999B2Publication Date: 2016-01-26
- Inventor: Barry J. Blasenheim , Amit Shachaf
- Applicant: Nanometrics Incorporated
- Applicant Address: US CA Milpitas
- Assignee: Nanometrics Incorporated
- Current Assignee: Nanometrics Incorporated
- Current Assignee Address: US CA Milpitas
- Agency: Silicon Valley Patent Group LLP
- Main IPC: G01J4/00
- IPC: G01J4/00 ; G01N21/21 ; G02B7/28

Abstract:
An ellipsometer includes an integrated focusing system with a beam splitter between the sample and the ellipsometer detector. The beam splitter provides a portion of the radiation to a lens system that magnifies any deviation from a best focus position by at least 2×. The focusing system includes a 2D sensor, where the spot of light focused on the sensor is 50 percent or smaller than the sensor. The focusing system may further include a compensator to correct optical aberrations caused by the beam splitter. A processor receives an image signal and finds the location of the spot from which focus error can be determined and used to correct the focal position of the ellipsometer. The processor compensates for movement of the spot caused by rotating optics. Additionally, a proportional-integral-derivative controller may be used to control exposure time and/or gain of the camera.
Public/Granted literature
- US20140098369A1 ELLIPSOMETER FOCUSING SYSTEM Public/Granted day:2014-04-10
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