Invention Grant
- Patent Title: PZT-based ferroelectric thin film and method of forming the same
- Patent Title (中): 基于PZT的铁电薄膜及其形成方法
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Application No.: US14182308Application Date: 2014-02-18
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Publication No.: US09251955B2Publication Date: 2016-02-02
- Inventor: Toshihiro Doi , Hideaki Sakurai , Nobuyuki Soyama , Takashi Noguchi
- Applicant: MITSUBISHI MATERIALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Priority: JP2013-073150 20130329
- Main IPC: H01G4/06
- IPC: H01G4/06 ; H01G4/08 ; H01G4/018 ; H01G4/30 ; C23C16/40 ; H01L21/02 ; H01L49/02 ; B05D1/38 ; B05D3/02

Abstract:
A PZT-based ferroelectric thin film is formed by coating a PZT-based ferroelectric thin film-forming composition on a lower electrode of a substrate one or two or more times, pre-baking the composition, and baking the composition to be crystallized, and this thin film includes PZT-based particles having an average particle size in a range of 500 nm to 3000 nm when measured on a surface of the thin film, in which heterogeneous fine particles having an average particle size of 20 nm or less, which are different from the PZT-based particles, are precipitated on a part or all of the grain boundaries on the surface of the thin film.
Public/Granted literature
- US20140293505A1 PZT-BASED FERROELECTRIC THIN FILM AND METHOD OF FORMING THE SAME Public/Granted day:2014-10-02
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