Invention Grant
- Patent Title: Concentration-modulated coatings
- Patent Title (中): 浓度调制涂层
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Application No.: US11672207Application Date: 2007-02-07
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Publication No.: US09255030B2Publication Date: 2016-02-09
- Inventor: Klaus Hartig
- Applicant: Klaus Hartig
- Applicant Address: US MN Eden Prairie
- Assignee: Cardinal CG Company
- Current Assignee: Cardinal CG Company
- Current Assignee Address: US MN Eden Prairie
- Agency: Fredrikson & Byron, P.A.
- Main IPC: C23C14/24
- IPC: C23C14/24 ; C03C17/36 ; C23C14/35 ; C23C14/08 ; C23C14/56

Abstract:
The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.
Public/Granted literature
- US20070138000A1 CONCENTRATION-MODULATED COATINGS Public/Granted day:2007-06-21
Information query
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