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    Methods and equipment for depositing coatings having sequenced structures
    4.
    发明授权
    Methods and equipment for depositing coatings having sequenced structures 有权
    用于沉积具有测序结构的涂层的方法和设备

    公开(公告)号：US07534466B2

    公开(公告)日：2009-05-19

    申请号：US11273979

    申请日：2005-11-15

    Applicant: Klaus Hartig

    Inventor： Klaus Hartig

    IPC: B05D5/06 ,  C23C16/00 ,  B05D1/36

    CPC classification number: C03C17/002 ,  C03C17/3417 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3644 ,  C03C17/3652 ,  C03C2217/71 ,  C03C2218/365 ,  C23C14/568

    Abstract: Methods and equipment are provided for processing sheet-like substrates. The methods and equipment are useful for depositing coatings on both major surfaces of a sheet-like substrate. Also provided are substrates with coatings on both major surfaces. Preferably, the coatings on the opposed major surfaces of a substrate have different structures, yet share a common structural sequence of at least two film regions, and in some embodiments at least three film regions.

    Abstract translation: 提供了用于处理片状基材的方法和设备。 所述方法和设备可用于在片状基底的两个主表面上沉积涂层。 还提供了在两个主表面上具有涂层的基底。 优选地，衬底的相对主表面上的涂层具有不同的结构，但是共享至少两个膜区域的共同结构序列，并且在一些实施方案中共享至少三个膜区域。

    Corrosion-resistant low-emissivity coatings
    7.
    发明授权
    Corrosion-resistant low-emissivity coatings 有权
    耐腐蚀低辐射涂层

    公开(公告)号：US07241506B2

    公开(公告)日：2007-07-10

    申请号：US10862770

    申请日：2004-06-07

    Applicant: Klaus Hartig

    Inventor： Klaus Hartig

    IPC: B32B17/06

    CPC classification number: C03C17/3613 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/366 ,  C03C17/3681 ,  C03C2217/78 ,  Y10T428/24 ,  Y10T428/265

    Abstract: A corrosion-resistant low-emissivity coating is provided. The low-emissivity coating comprises, in sequence outwardly, a corrosion-resistant inner infrared-reflective layer, a transparent dielectric middle coat, and an outer infrared-reflective layer. The outer infrared-reflective layer consists essentially of silver and the corrosion-resistant inner infrared-reflective layer has a different composition than the outer infrared-reflective layer. Also provided are methods for depositing coatings of this nature, as well as substrates bearing these coatings.

    Abstract translation: 提供耐腐蚀的低辐射涂层。 低辐射涂层依次向外包括耐腐蚀的内部红外反射层，透明电介质中间涂层和外部红外反射层。 外部红外反射层基本上由银组成，耐腐蚀的内部红外反射层具有与外部红外反射层不同的组成。 还提供了用于沉积这种性质的涂层以及承载这些涂层的基材的方法。

    CONCENTRATION-MODULATED COATINGS
    8.
    发明申请
    CONCENTRATION-MODULATED COATINGS 有权
    浓度调节涂料

    公开(公告)号：US20070138000A1

    公开(公告)日：2007-06-21

    申请号：US11672207

    申请日：2007-02-07

    Applicant: Klaus Hartig

    Inventor： Klaus Hartig

    IPC: C23C16/00 ,  C23C14/32 ,  C23C14/00

    CPC classification number: C03C17/3613 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3694 ,  C23C14/086 ,  C23C14/352 ,  C23C14/568 ,  Y10T428/265

    Abstract: The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.

    Abstract translation: 本发明提供一种承载低发射率涂层的基片。 低辐射涂层包括至少一个分级膜区域。 在某些实施例中，在双型低辐射率涂层的两个红外反射层之间提供至少一个分级膜区域。 分级膜区域具有基本上连续降低的第一介电材料的浓度和基本上连续增加的第二介电材料的浓度。 还提供了沉积这种低辐射率涂层和承载这些涂层的基材的方法。

    Plasma-enhanced film deposition
    9.
    发明授权
    Plasma-enhanced film deposition 有权
    等离子体增强膜沉积

    公开(公告)号：US07157123B2

    公开(公告)日：2007-01-02

    申请号：US10739887

    申请日：2003-12-18

    Applicant: Klaus Hartig

    Inventor： Klaus Hartig

    IPC: H05H1/04

    CPC classification number: H01J37/32862 ,  C23C16/4404 ,  C23C16/4405 ,  C23C16/509 ,  H01J37/34

    Abstract: Methods and equipment for depositing films. In certain embodiments, there is provided a deposition chamber having a substrate-coating region and an electrode-cleaning region. In these embodiments, an electrode is positioned in the deposition chamber and has an interior cavity in which first and second magnet systems are disposed. In certain embodiments, there is provided a method for depositing films onto substrates using a deposition chamber of the described nature. The invention also provides electrode assemblies for film-deposition equipment. In certain embodiments, the electrode assembly comprises a rotatable electrode (optionally having an outer coating of carbon or the like) having an interior cavity, with stationary first and second generally-opposed magnet systems being disposed in this interior cavity.

    Abstract translation: 沉积膜的方法和设备。 在某些实施例中，提供了一种具有基底涂覆区域和电极清洁区域的沉积室。 在这些实施例中，电极位于沉积室中，并且具有内部空腔，第一和第二磁体系统设置在该内部空腔中。 在某些实施方案中，提供了一种使用所述性质的沉积室将膜沉积到基板上的方法。 本发明还提供了用于成膜设备的电极组件。 在某些实施例中，电极组件包括具有内部空腔的可旋转电极（可选地具有碳外部涂层等），固定的第一和第二大致相对的磁体系统设置在该内腔中。

    Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
    10.
    发明申请
    Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films 有权
    用于沉积亲水涂层的方法和设备，以及用于薄膜的沉积技术

    公开(公告)号：US20060118408A1

    公开(公告)日：2006-06-08

    申请号：US11129820

    申请日：2005-05-16

    Applicant: Kari Myli ,  Gary Pfaff ,  James Brownlee ,  John German ,  Annette Krisko ,  Klaus Hartig

    Inventor： Kari Myli ,  Gary Pfaff ,  James Brownlee ,  John German ,  Annette Krisko ,  Klaus Hartig

    IPC: C23C14/32 ,  C23C14/00

    CPC classification number: C23C14/568 ,  C03C17/002 ,  C03C17/22 ,  C03C17/34 ,  C03C2217/71 ,  C03C2218/154 ,  C03C2218/36 ,  C03C2218/365 ,  C23C14/352

    Abstract: The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

    Abstract translation: 本发明提供了涉及用于施加包含二氧化硅和二氧化钛的混合氧化物膜的溅射技术的某些实施方案。 在这些实施例中，这些技术涉及在公共室中（例如，在共享气体气氛中）溅射至少两个靶。 这些目标中的第一个包括硅，而第二个目标包括钛。 此外，本发明提供了涉及具有亲水涂层的基底的实施例，其可以通过溅射或任何其它合适的薄膜沉积技术进行沉积。 本发明还提供了用于沉积各种涂层类型的技术和装置。 例如，本发明提供了使用溅射装置或其它薄膜沉积装置的薄膜沉积技术。

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