Invention Grant
US09255322B2 Substrate processing system having symmetric RF distribution and return paths
有权
基板处理系统具有对称的RF分布和返回路径
- Patent Title: Substrate processing system having symmetric RF distribution and return paths
- Patent Title (中): 基板处理系统具有对称的RF分布和返回路径
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Application No.: US13436776Application Date: 2012-03-30
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Publication No.: US09255322B2Publication Date: 2016-02-09
- Inventor: Donny Young , Alan Ritchie , Muhammad Rasheed , Keith A. Miller
- Applicant: Donny Young , Alan Ritchie , Muhammad Rasheed , Keith A. Miller
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/32 ; C23C14/35 ; H01J37/34
Abstract:
A processing system may include a target having a central axis normal thereto; a source distribution plate having a target facing side opposing a backside of the target, wherein the source distribution plate includes a plurality of first features such that a first distance of a first radial RF distribution path along a given first diameter is about equal to a second distance of an opposing second radial RF distribution path along the given first diameter; and a ground plate opposing a target opposing side of the source distribution plate and having a plurality of second features disposed about the central axis and corresponding to the plurality of first features, wherein a third distance of a first radial RF return path along a given second diameter is about equal to a fourth distance of an opposing second radial RF return path along the given second diameter.
Public/Granted literature
- US20130256127A1 SUBSTRATE PROCESSING SYSTEM HAVING SYMMETRIC RF DISTRIBUTION AND RETURN PATHS Public/Granted day:2013-10-03
Information query
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