Invention Grant
- Patent Title: Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply
- Patent Title (中): 流体处理结构，光刻设备和装置制造方法涉及气体供应
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Application No.: US13090311Application Date: 2011-04-20
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Publication No.: US09256136B2Publication Date: 2016-02-09
- Inventor: Rogier Hendrikus Magdalena Cortie , Paulus Martinus Maria Liebregts , Michel Riepen , Fabrizio Evangelista
- Applicant: Rogier Hendrikus Magdalena Cortie , Paulus Martinus Maria Liebregts , Michel Riepen , Fabrizio Evangelista
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
Public/Granted literature
- US20110261332A1 FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-10-27
Information query
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