Invention Grant
- Patent Title: Bonding method using porosified surfaces for making stacked structures
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Application No.: US14591896Application Date: 2015-01-07
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Publication No.: US09272899B2Publication Date: 2016-03-01
- Inventor: Rama Krishna Kotlanka , Rakesh Kumar , Premachandran Chirayarikathuveedu Sankarapillai , Huamao Lin , Pradeep Yelehanka
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Horizon IP Pte. Ltd.
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L25/065 ; B81B7/00 ; H01L21/50 ; B81C1/00 ; B81C3/00 ; H01L23/522

Abstract:
A bonded device having at least one porosified surface is disclosed. The porosification process introduces nanoporous holes into the microstructure of the bonding surfaces of the devices. The material property of a porosified material is softer as compared to a non-porosified material. For the same bonding conditions, the use of the porosified bonding surfaces enhances the bond strength of the bonded interface as compared to the non-porosified material.
Public/Granted literature
- US20150115453A1 BONDING METHOD USING POROSIFIED SURFACES FOR MAKING STACKED STRUCTURES Public/Granted day:2015-04-30
Information query
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