Invention Grant
- Patent Title: Multi charged particle beam writing method, and multi charged particle beam writing apparatus
- Patent Title (中): 多带电粒子束写入方法和多带电粒子束写入装置
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Application No.: US14721363Application Date: 2015-05-26
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Publication No.: US09275824B2Publication Date: 2016-03-01
- Inventor: Hiroshi Matsumoto
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-114526 20140603
- Main IPC: G11B9/10
- IPC: G11B9/10 ; H01J37/147 ; H01J37/20 ; H01J37/06 ; H01J37/317

Abstract:
A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others.
Public/Granted literature
- US20150348741A1 MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2015-12-03
Information query
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