Invention Grant
US09275824B2 Multi charged particle beam writing method, and multi charged particle beam writing apparatus 有权
多带电粒子束写入方法和多带电粒子束写入装置

Multi charged particle beam writing method, and multi charged particle beam writing apparatus
Abstract:
A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others.
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