Invention Grant
US09276146B2 Infrared sensor device and method for producing an infrared sensor device 有权
红外线传感器装置及其制造方法

Infrared sensor device and method for producing an infrared sensor device
Abstract:
An infrared sensor device includes at least one sensor element formed in a semiconductor substrate, an SOI wafer that defines a gap below and around the sensor element, and a suspension device that is configured to suspend the sensor element in the SOI wafer. The sensor element is substantially arranged below the suspension device, thereby achieving a high sensitivity, low thermal capacity, low thermal coupling to the substrate and a high image refresh rate.
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