Invention Grant
- Patent Title: Imprint lithography method and apparatus
-
Application No.: US14605637Application Date: 2015-01-26
-
Publication No.: US09278466B2Publication Date: 2016-03-08
- Inventor: Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: C03C15/00
- IPC: C03C15/00 ; B29C43/34 ; B44C1/20 ; B82Y10/00 ; B82Y40/00 ; G03F7/00 ; B29C43/02 ; B29C43/58 ; B29K101/12
Abstract:
In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
Public/Granted literature
- US20150136324A1 IMPRINT LITHOGRAPHY METHOD AND APPARATUS Public/Granted day:2015-05-21
Information query
