Invention Grant
- Patent Title: Method for producing hexachlorodisilane
- Patent Title (中): 六氯二硅烷的制备方法
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Application No.: US13512678Application Date: 2010-12-02
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Publication No.: US09278865B2Publication Date: 2016-03-08
- Inventor: Norbert Auner , Christian Bauch , Sven Holl , Rumen Deltschew , Javad Mohsseni , Gerd Lippold , Thoralf Gebel
- Applicant: Norbert Auner , Christian Bauch , Sven Holl , Rumen Deltschew , Javad Mohsseni , Gerd Lippold , Thoralf Gebel
- Applicant Address: LU Luxembourg
- Assignee: Spawnt Private S.à.r.l.
- Current Assignee: Spawnt Private S.à.r.l.
- Current Assignee Address: LU Luxembourg
- Agency: DLA Piper LLP (US)
- Priority: DE102009056438 20091202
- International Application: PCT/EP2010/068728 WO 20101202
- International Announcement: WO2011/067331 WO 20110609
- Main IPC: C01B33/107
- IPC: C01B33/107
Abstract:
A method produces hexachlorodisilane. Hexachlorodisilane is obtained by oxidative splitting of the chlorinated polysilane of the empirical formula SiClx (x=0,2-0,8) using chlorine gas. The hexachlorodisilane is selectively obtained with a high yield.
Public/Granted literature
- US20130017138A1 METHOD FOR PRODUCING HEXACHLORODISILANE Public/Granted day:2013-01-17
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