Invention Grant
US09279180B2 Machine for plasma treatment of containers comprising an integrated vacuum circuit
有权
用于等离子体处理包括集成真空电路的容器的机器
- Patent Title: Machine for plasma treatment of containers comprising an integrated vacuum circuit
- Patent Title (中): 用于等离子体处理包括集成真空电路的容器的机器
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Application No.: US12303871Application Date: 2007-06-07
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Publication No.: US09279180B2Publication Date: 2016-03-08
- Inventor: Jean-Michel Rius
- Applicant: Jean-Michel Rius
- Applicant Address: FR Octeville sur Mer
- Assignee: SIDEL PARTICIPATIONS
- Current Assignee: SIDEL PARTICIPATIONS
- Current Assignee Address: FR Octeville sur Mer
- Agency: Sughrue Mion, PLLC
- Priority: FR0605089 20060608
- International Application: PCT/FR2007/000938 WO 20070607
- International Announcement: WO2007/141426 WO 20071213
- Main IPC: G01L27/02
- IPC: G01L27/02 ; C23C16/04 ; C23C16/511 ; C23C16/54 ; H01J37/32 ; B05D1/00 ; B05D7/22
Abstract:
A machine for plasma treatment of containers, including a chamber for receiving a container to be treated, the chamber connected to a primary vacuum circuit. A pressure sensor is connected to the chamber. There is a first mechanism for communicating the pressure sensor with the chamber; a secondary vacuum circuit dependent on the first circuit and connected to the pressure sensor; and second mechanism for communicating the pressure sensor with the secondary vacuum circuit.
Public/Granted literature
- US20110252861A1 MACHINE FOR PLASMA TREATMENT OF CONTAINERS COMPRISING AN INTEGRATED VACUUM CIRCUIT Public/Granted day:2011-10-20
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