Invention Grant
- Patent Title: Substrate table assembly, an immersion lithographic apparatus and a device manufacturing method
- Patent Title (中): 衬底台组件，浸没式光刻设备和器件制造方法
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Application No.: US13569926Application Date: 2012-08-08
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Publication No.: US09280063B2Publication Date: 2016-03-08
- Inventor: Johan Gertrudis Cornelis Kunnen , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
- Applicant: Johan Gertrudis Cornelis Kunnen , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/52 ; G03B27/58 ; G03B27/60 ; G03F7/20 ; H01L21/683
Abstract:
A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m·K) at 298 K.
Public/Granted literature
- US20130038854A1 SUBSTRATE TABLE ASSEMBLY, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD Public/Granted day:2013-02-14
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