Invention Grant
- Patent Title: Ion processing utilizing segmented vacuum manifold
- Patent Title (中): 利用分段式真空歧管进行离子处理
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Application No.: US13906023Application Date: 2013-05-30
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Publication No.: US09281173B2Publication Date: 2016-03-08
- Inventor: Alexander Mordehai , Mark H. Werlich , Ruwan T. Kurulugama , Thomas A. Knotts
- Applicant: Agilent Technologies, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Agilent Technologies, Inc.
- Current Assignee: Agilent Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01J49/06
- IPC: H01J49/06 ; H01J49/26 ; G01N27/62

Abstract:
An ion processing device includes electrically conductive vacuum manifold segments serially positioned and enclosing a volume along an axis. The segments are electrically isolated from each other and independently addressable by a voltage source. An ion optics device is positioned in the volume. A voltage differential between each manifold segment and the ion optics device is maintained below a maximum value by applying different voltages to respective manifold segments. The voltage differential may be controlled to avoid voltage breakdown in a low-pressure, high-voltage gas environment. The ion optics device may in some cases be an ion mobility drift cell.
Public/Granted literature
- US20140353483A1 ION PROCESSING UTILIZING SEGMENTED VACUUM MANIFOLD Public/Granted day:2014-12-04
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