Invention Grant
- Patent Title: Semiconductor layer including compositional inhomogeneities
- Patent Title (中): 半导体层包括组成不均匀性
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Application No.: US14285738Application Date: 2014-05-23
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Publication No.: US09281441B2Publication Date: 2016-03-08
- Inventor: Michael Shur , Rakesh Jain , Maxim S. Shatalov , Alexander Dobrinsky , Jinwei Yang , Remigijus Gaska
- Applicant: Sensor Electronic Technology, Inc.
- Applicant Address: US SC Columbia
- Assignee: Sensor Electronic Technology, Inc.
- Current Assignee: Sensor Electronic Technology, Inc.
- Current Assignee Address: US SC Columbia
- Agency: LaBatt, LLC
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L33/18 ; H01L33/30 ; H01S5/343 ; H01S5/32 ; H01S5/34

Abstract:
A device comprising a semiconductor layer including a plurality of compositional inhomogeneous regions is provided. The difference between an average band gap for the plurality of compositional inhomogeneous regions and an average band gap for a remaining portion of the semiconductor layer can be at least thermal energy. Additionally, a characteristic size of the plurality of compositional inhomogeneous regions can be smaller than an inverse of a dislocation density for the semiconductor layer.
Public/Granted literature
- US20140346441A1 Semiconductor Layer Including Compositional Inhomogeneities Public/Granted day:2014-11-27
Information query
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