Invention Grant
- Patent Title: Measurement of the position of a radiation beam spot in lithography
- Patent Title (中): 光刻中辐射束斑位置的测量
-
Application No.: US14001478Application Date: 2012-02-22
-
Publication No.: US09304401B2Publication Date: 2016-04-05
- Inventor: Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
- Applicant: Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2012/052984 WO 20120222
- International Announcement: WO2012/130532 WO 20121004
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/54 ; G03B27/58 ; G03B27/72 ; G03B27/74 ; G03F7/20 ; G03F9/00
Abstract:
A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
Public/Granted literature
- US20130335721A1 MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY Public/Granted day:2013-12-19
Information query
