Invention Grant
- Patent Title: Semiconductor device having areas with different conductivity types and different doping concentrations
- Patent Title (中): 具有不同导电类型和掺杂浓度不同的区域的半导体器件
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Application No.: US14049839Application Date: 2013-10-09
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Publication No.: US09306011B2Publication Date: 2016-04-05
- Inventor: Markus Zundel , Thomas Schweinboeck , Jesper Wittborn , Erwin Bacher , Juergen Holzmueller , Hans-Joachim Schulze
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L29/36 ; H01L21/265 ; H01L21/66 ; H01L51/05 ; H01L29/06 ; H01L21/266

Abstract:
A semiconductor device includes a semiconductor substrate. The semiconductor substrate includes a plurality of first doping regions of a first doping structure arranged at a main surface of the semiconductor substrate and a plurality of second doping regions of the first doping structure arranged at the main surface of the semiconductor substrate. The first doping regions of the plurality of first doping regions of the first doping structure include dopants of a first conductivity type with different doping concentrations. Further, the second doping regions of the plurality of second doping regions of the first doping structure include dopants of a second conductivity type with different doping concentrations. At least one first doping region of the plurality of first doping regions of the first doping structure partly overlaps at least one second doping region of the plurality of second doping regions of the first doping structure causing an overlap region arranged at the main surface.
Public/Granted literature
- US20150097184A1 Semiconductor Device and a Method for Forming a Semiconductor Device Public/Granted day:2015-04-09
Information query
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