Invention Grant
- Patent Title: Light-emitting device
- Patent Title (中): 发光装置
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Application No.: US14618037Application Date: 2015-02-10
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Publication No.: US09306115B1Publication Date: 2016-04-05
- Inventor: Yi-Chieh Lin
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L33/26
- IPC: H01L33/26 ; H01L33/00

Abstract:
A light-emitting device, comprises: a substrate; and an active structure on the substrate and comprising a well layer and a barrier layer, wherein the well layer comprises multiple different elements of group VA; wherein the well layer and the barrier layer each has a residual compressive stress, and the residual compressive stress of the well layer is larger than the residual compressive stress of the barrier layer.
Public/Granted literature
- US2208091A Frequency variation response circuit Public/Granted day:1940-07-16
Information query
IPC分类: