Invention Grant
- Patent Title: Ultraviolet light generating target, electron-beam-excited ultraviolet light source, and method for producing ultraviolet light generating target
- Patent Title (中): 紫外线发光靶，电子束激发紫外光源，以及紫外线发生靶的制造方法
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Application No.: US14113383Application Date: 2012-04-24
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Publication No.: US09318312B2Publication Date: 2016-04-19
- Inventor: Yoshinori Honda , Fumitsugu Fukuyo , Yuji Kasamatsu , Takashi Suzuki , Takeaki Hattori , Koji Kawai , Shucheng Chu , Hiroyuki Taketomi
- Applicant: Yoshinori Honda , Fumitsugu Fukuyo , Yuji Kasamatsu , Takashi Suzuki , Takeaki Hattori , Koji Kawai , Shucheng Chu , Hiroyuki Taketomi
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2011-097501 20110425
- International Application: PCT/JP2012/060976 WO 20120424
- International Announcement: WO2012/147744 WO 20121101
- Main IPC: G01J1/42
- IPC: G01J1/42 ; G01N21/64 ; H01J63/02 ; H01J29/20 ; H01J63/06 ; C09K11/77 ; H01J63/04
Abstract:
An ultraviolet light generating target 20 includes a substrate 21 made of sapphire, quartz, or rock crystal; and a light-emitting layer 22 that is provided on the substrate 21 and that generates ultraviolet light upon receiving an electron beam. The light-emitting layer 22 includes powdered or granular Pr:LuAG crystals. By using such a light-emitting layer 22 as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.
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