Invention Grant
- Patent Title: Thermal control in variable aperture mechanism for cryogenic environment
- Patent Title (中): 用于低温环境的可变孔径机构的热控制
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Application No.: US14170348Application Date: 2014-01-31
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Publication No.: US09323130B2Publication Date: 2016-04-26
- Inventor: Jeffrey P. Yanevich , Michael L. Brest , Kenneth L. McAllister , James E. Scroggin , Gregory D. Tracy , Julio C. Dominguez
- Applicant: Raytheon Company
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Main IPC: G03B9/08
- IPC: G03B9/08 ; G01J5/08 ; G03B9/02 ; G01J3/12 ; G01J3/28 ; G01J3/32 ; G01J5/02 ; G01J5/06 ; G01J5/62 ; G01J3/02

Abstract:
A shutter assembly comprising a first planar member and a second planar member opposed from one another and forming a sleeve having a cavity therebetween, the sleeve having a pair of side rails adjacent the cavity along sides of the sleeve. A first shutter member having a first end is disposed in the cavity and slidingly disposed along one of the side rails, and a second shutter member having a second end is disposed in the cavity and slidingly disposed along the other side rail. The first end is opposed to the second end and is configured to be selectively advanced towards, and retracted from, the second end so as to define an aperture therebetween having a first shape when disposed in a first position, and wherein the aperture has a second larger shape when the first end is disposed in a second position. The first shutter member and the second shutter member maintain a thermal contact with the side rails and the planar members in all positions. The shutter assembly is well suited to be used at a cryogenic temperature and in a high vacuum environment.
Public/Granted literature
- US20140363151A1 THERMAL CONTROL IN VARIABLE APERTURE MECHANISM FOR CRYOGENIC ENVIRONMENT Public/Granted day:2014-12-11
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