Invention Grant
- Patent Title: Planar design to non-planar design conversion method
- Patent Title (中): 平面设计为非平面设计转换方法
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Application No.: US14337187Application Date: 2014-07-21
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Publication No.: US09323883B2Publication Date: 2016-04-26
- Inventor: Chao-Yao Chiang , Kuo-Hsun Huang , Chien-Hung Chen
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Priority: TW103119425A 20140604
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A planar design to non-planar design conversion method includes following steps. At least a diffusion region pattern including a first side and a second side perpendicular to each other is received. A look-up table is queried to obtain a first positive integer according to the first side of the diffusion region pattern and a second positive integer according to the second side of the diffusion region pattern. Then, a plurality of fin patterns is formed. An amount of the fin patterns is equal to the second positive integer. The fin patterns respectively include a first fin length, and the first fin length is a product of the first positive integer and a predetermined value. The forming is performed by at least a computer-aided design (CAD) tool.
Public/Granted literature
- US20150356231A1 PLANAR DESIGN TO NON-PLANAR DESIGN CONVERSION METHOD Public/Granted day:2015-12-10
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