Invention Grant
- Patent Title: Pattern determination device and computer program
- Patent Title (中): 图案确定装置和计算机程序
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Application No.: US13882134Application Date: 2011-10-14
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Publication No.: US09329034B2Publication Date: 2016-05-03
- Inventor: Hitoshi Namai , Satoru Yamaguchi , Fumihiro Sasajima
- Applicant: Hitoshi Namai , Satoru Yamaguchi , Fumihiro Sasajima
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2010-240253 20101027
- International Application: PCT/JP2011/005749 WO 20111014
- International Announcement: WO2012/056639 WO 20120503
- Main IPC: G01B21/30
- IPC: G01B21/30 ; H01J37/28

Abstract:
An object of the invention is to provide: a sample unevenness device that stably identifies unevenness formed on a sample, regardless of a pattern formation state or image acquisition conditions; and a computer program. As an aspect to achieve the above object, a device and computer program are proposed that obtain the area of a plurality of regions formed by a profile waveform of a given threshold or lower for a profile formed based on a detection signal obtained by scanning with a charged particle beam with respect to the sample; and determine either or both of that a site corresponding to a region with a relatively large area is a concave portion or that a space portion and a site corresponding to a space with a relatively small area is a convex portion or a line portion.
Public/Granted literature
- US20130270436A1 PATTERN DETERMINATION DEVICE AND COMPUTER PROGRAM Public/Granted day:2013-10-17
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