Invention Grant
US09329071B2 Substrate processing apparatus 有权
基板加工装置

Substrate processing apparatus
Abstract:
The amount of processing liquid consumed from the processing liquid in the tank is calculated based on the history of opening and closing events of one or more of the valves, and that the anomaly detection controller of the substrate processing apparatus generates a level sensor failure alarm if the calculated amount of consumed processing liquid has increased beyond a state transition liquid consumption amount and yet the level sensor has not switched from the first state to the second state. The substrate processing apparatus and the level sensor are designed so that the level sensor switches from the first state to the second state when the calculated amount of consumed processing liquid has increased beyond the state transition liquid consumption amount.
Public/Granted literature
Information query
Patent Agency Ranking
0/0