Invention Grant
- Patent Title: Lithographic apparatuses and methods for compensating for eigenmode coupling
- Patent Title (中): 用于补偿本征模耦合的光刻设备和方法
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Application No.: US13861053Application Date: 2013-04-11
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Publication No.: US09329502B2Publication Date: 2016-05-03
- Inventor: Christopher Charles Ward , Mark Henricus Wilhelmus Van Gerven , Bram Paul Theodoor Van Goch
- Applicant: ASML Holding N.V. , ASML Netherlands B.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; F16F15/00
Abstract:
A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.
Public/Granted literature
- US20130278915A1 Lithographic Apparatuses and Methods for Compensating For Eigenmode Coupling Public/Granted day:2013-10-24
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