Invention Grant
- Patent Title: High electron mobility transistor
- Patent Title (中): 高电子迁移率晶体管
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Application No.: US14328241Application Date: 2014-07-10
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Publication No.: US09331154B2Publication Date: 2016-05-03
- Inventor: Hsien-Chin Chiu , Chien-Kai Tung , Heng-Kuang Lin , Chih-Wei Yang , Hsiang-Chun Wang
- Applicant: EPISTAR CORPORATION , HUGA OPTOTECH, INC
- Applicant Address: TW Hsinchu TW Hsinchu
- Assignee: EPISTAR CORPORATION,HUGA OPTOTECH, INC
- Current Assignee: EPISTAR CORPORATION,HUGA OPTOTECH, INC
- Current Assignee Address: TW Hsinchu TW Hsinchu
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/20 ; H01L29/417 ; H01L29/423 ; H01L29/778

Abstract:
A high electron mobility transistor comprises a substrate, an epitaxial stack arranged above the substrate and having a first region and a second region surrounding the first region, a matrix electrode structure arranged in the first region, and a plurality of first bridges electrically connecting the plurality of second electrodes. The matrix electrode structure comprises a plurality of first electrodes arranged on the epitaxial stack and a plurality of second electrodes arranged on the epitaxial stack and adjacent to the plurality of first electrodes. One of the bridges is arranged between two of the second electrodes and crossed over one of the first electrodes.
Public/Granted literature
- US20150054034A1 HIGH ELECTRON MOBILITY TRANSISTOR Public/Granted day:2015-02-26
Information query
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