Invention Grant
- Patent Title: Semiconductor structure with inhomogeneous regions
- Patent Title (中): 具有不均匀区域的半导体结构
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Application No.: US14189012Application Date: 2014-02-25
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Publication No.: US09331244B2Publication Date: 2016-05-03
- Inventor: Maxim S Shatalov , Alexander Dobrinsky , Alexander Lunev , Rakesh Jain , Jinwei Yang , Michael Shur , Remigijus Gaska
- Applicant: Sensor Electronic Technology, Inc.
- Applicant Address: US SC Columbia
- Assignee: Sensor Electronic Technology, Inc.
- Current Assignee: Sensor Electronic Technology, Inc.
- Current Assignee Address: US SC Columbia
- Agency: LaBatt, LLC
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/32 ; H01L33/10 ; H01S5/022

Abstract:
A semiconductor layer including a plurality of inhomogeneous regions is provided. Each inhomogeneous region has one or more attributes that differ from a material forming the semiconductor layer. The inhomogeneous regions can include one or more regions configured based on radiation having a target wavelength. These regions can include transparent and/or reflective regions. The inhomogeneous regions also can include one or more regions having a higher conductivity than a conductivity of the radiation-based regions, e.g., at least ten percent higher.
Public/Granted literature
- US20140239312A1 Semiconductor Structure with Inhomogeneous Regions Public/Granted day:2014-08-28
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