Invention Grant
- Patent Title: Method for producing conductive tracks
- Patent Title (中): 导电轨道的制造方法
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Application No.: US14403922Application Date: 2013-02-14
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Publication No.: US09332648B2Publication Date: 2016-05-03
- Inventor: Vasiliy Sergeevich Anosov , Vasiliy Vasilevich Volodin , Gennadiy Gyusamovich Gromov , Elena Vladmirovna Mazikina , Aleksandr Aleksandrovich Nazarenko , Sergey Sergeevich Ryabov
- Applicant: RMT Limited
- Applicant Address: RU Nizhny Novgorod
- Assignee: RMT Limited
- Current Assignee: RMT Limited
- Current Assignee Address: RU Nizhny Novgorod
- Agency: Craft Chu PLLC
- Agent Andrew W. Chu
- Priority: RU2012123608 20120607
- International Application: PCT/RU2013/000116 WO 20130214
- International Announcement: WO2013/184028 WO 20131212
- Main IPC: H05K3/02
- IPC: H05K3/02 ; H05K3/06 ; H05K3/24 ; H01L23/498 ; H01L21/48 ; H05K1/03

Abstract:
The method for producing conductive tracks includes applying continuous metallization layers to a non-conductive substrate, forming a metallization pattern, and applying to the formed tracks a protective barrier layer and a layer for soldering and/or welding elements of parts to the conductive tracks. The continuous metallization layers are applied by consecutively applying an adhesive layer, a conductive layer, and a metal layer, acting as a mask, to the non-conductive substrate. To form the metallization pattern, a mask is formed by laser ablation on sections of the metal layer not occupied by conductive tracks, then selective chemical etching removes the conductive layer and adhesive sublayer from the exposed sections, and selective chemical etching removes the mask, after which the protective barrier layer and layer for soldering and/or welding are applied.
Public/Granted literature
- US20150173202A1 METHOD FOR PRODUCING CONDUCTIVE TRACKS Public/Granted day:2015-06-18
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