Invention Grant
US09334569B2 Sample preparation device to form a matrix film for matrix assisted laser desorption/ionization method
有权
用于形成基质辅助激光解吸/电离方法的基质膜的样品制备装置
- Patent Title: Sample preparation device to form a matrix film for matrix assisted laser desorption/ionization method
- Patent Title (中): 用于形成基质辅助激光解吸/电离方法的基质膜的样品制备装置
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Application No.: US13674745Application Date: 2012-11-12
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Publication No.: US09334569B2Publication Date: 2016-05-10
- Inventor: Kazuteru Takahashi , Kiyoshi Ogawa
- Applicant: SHIMADZU CORPORATION
- Applicant Address: JP Kyoto
- Assignee: SHIMADZU CORPORATION
- Current Assignee: SHIMADZU CORPORATION
- Current Assignee Address: JP Kyoto
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-264663 20111202; JP2012-159296 20120718
- Main IPC: C23C14/54
- IPC: C23C14/54 ; C23C14/24 ; G01B11/06 ; C23C16/52 ; C23C14/12

Abstract:
To provide a sample preparation device that is appropriate for the formation of a matrix film for MALDI through vacuum vapor deposition. A sample preparation device is provided with: a sample substrate support unit 23 for supporting a substance to be analyzed on a substrate S so that the substance faces a vapor deposition source 21 for a matrix substance J; a light amount measurement unit for irradiating a matrix film vapor deposited on the substrate S with measurement light diagonally and detecting the amount of measurement light that has transmitted through or has been reflected from the above-described matrix film diagonally; and an adhesion prevention means 23a for preventing the matrix substance that has flown off from the above-described vapor deposition source 21 from adhering to the above-described light amount measurement unit.
Public/Granted literature
- US20130171349A1 SAMPLE PREPARATION DEVICE FOR MALDI AND SAMPLE PREPARATION METHOD Public/Granted day:2013-07-04
Information query
IPC分类: