Invention Grant
US09343295B2 Vaporizing unit, film forming apparatus, film forming method, computer program and storage medium
有权
蒸发装置，成膜装置，成膜方法，计算机程序和存储介质
- Patent Title: Vaporizing unit, film forming apparatus, film forming method, computer program and storage medium
- Patent Title (中): 蒸发装置，成膜装置，成膜方法，计算机程序和存储介质
-
Application No.: US14281242Application Date: 2014-05-19
-
Publication No.: US09343295B2Publication Date: 2016-05-17
- Inventor: Ikuo Sawada , Sumie Nagaseki , Kyoko Ikeda , Tatsuro Ohshita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Minato-ku
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-241364 20070918
- Main IPC: H01H21/02
- IPC: H01H21/02 ; H01L21/02 ; C23C16/448 ; H01L21/316 ; H01L21/318
Abstract:
A vaporizing unit, in supplying a gas material produced by vaporizing a liquid material onto a substrate to conduct a film forming process, can vaporize the liquid material with high efficiency to suppress generation of particles. With the vaporizing unit, positively or negatively charged bubbles, which have a diameter of 1000 nm or less, are produced in the liquid material, and the liquid material is atomized to form a mist of the liquid material. Further, the mist of the liquid material is heated and vaporized. The fine bubbles are uniformly dispersed in advance in the liquid material, so that very fine and uniform mist particles of the liquid material are produced when the liquid material is atomized, which makes heat exchange readily conducted. By vaporizing the mist of the liquid material, vaporization efficiency is enhanced, and generation of particles can be suppressed.
Public/Granted literature
- US20140256157A1 VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPUTER PROGRAM AND STORAGE MEDIUM Public/Granted day:2014-09-11
Information query
