- Patent Title: Method and apparatus for analyzing subsurfaces of a target material
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Application No.: US14643187Application Date: 2015-03-10
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Publication No.: US09345407B2Publication Date: 2016-05-24
- Inventor: Ervin Goldfain , Raymond A. Lia
- Applicant: Welch Allyn, Inc.
- Applicant Address: US NY Skaneateles Falls
- Assignee: WELCH ALLYN, INC.
- Current Assignee: WELCH ALLYN, INC.
- Current Assignee Address: US NY Skaneateles Falls
- Agency: Guntin & Gust, PLC
- Agent Robert Gingher
- Main IPC: A61B5/00
- IPC: A61B5/00 ; G01B9/02

Abstract:
A system that incorporates teachings of the present disclosure may include, for example, a method for aligning first and second light signals on an optical path directed to a target, where the first light signal provides a visualization of the target, and a portion of the second light signal reflects from at least one subsurface of the target. The method also includes aligning a first focal point of the first light signal and a second focal point of the second light signal, where the first focal point is at least in a first proximate location of the second focal point, and adjusting a first position of the first and second focal points to be in at least a second proximate location of the target without adjusting the at least first proximate location of the first focal point relative to the second focal point. Other embodiments are disclosed.
Public/Granted literature
- US20150173620A1 METHOD AND APPARATUS FOR ANALYZING SUBSURFACES OF A TARGET MATERIAL Public/Granted day:2015-06-25
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