Invention Grant
US09351081B2 Capacitive micromachined ultrasonic transducer (CMUT) with through-substrate via (TSV) substrate plug
有权
电容式微加工超声波换能器(CMUT),带有通孔(TSV)基板插头
- Patent Title: Capacitive micromachined ultrasonic transducer (CMUT) with through-substrate via (TSV) substrate plug
- Patent Title (中): 电容式微加工超声波换能器(CMUT),带有通孔(TSV)基板插头
-
Application No.: US13779210Application Date: 2013-02-27
-
Publication No.: US09351081B2Publication Date: 2016-05-24
- Inventor: Peter B Johnson , Ira Oaktree Wygant
- Applicant: Texas Instruments Incorporated
- Applicant Address: US TX Dallas
- Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee Address: US TX Dallas
- Agent Steven A. Shaw; Frank D. Cimino
- Main IPC: H02N1/00
- IPC: H02N1/00 ; H04R19/00 ; B06B1/02

Abstract:
A Capacitive Micromachined Ultrasonic Transducer (CMUT) device includes at least one CMUT cell including a first substrate of a single crystal material having a top side including a patterned dielectric layer thereon including a thick and a thin dielectric region, and a through-substrate via (TSV) extending a full thickness of the first substrate. The TSV is formed of the single crystal material, is electrically isolated by isolation regions in the single crystal material, and is positioned under a top side contact area of the first substrate. A membrane layer is bonded to the thick dielectric region and over the thin dielectric region to provide a movable membrane over a micro-electro-mechanical system (MEMS) cavity. A metal layer is over the top side substrate contact area and over the movable membrane including coupling of the top side substrate contact area to the movable membrane.
Public/Granted literature
- US20140239768A1 CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (CMUT) WITH THROUGH-SUBSTRATE VIA (TSV) SUBSTRATE PLUG Public/Granted day:2014-08-28
Information query