Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US14390583Application Date: 2013-03-04
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Publication No.: US09355814B2Publication Date: 2016-05-31
- Inventor: Tsunenori Nomaguchi , Toshihide Agemura
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2012-084426 20120403
- International Application: PCT/JP2013/055772 WO 20130304
- International Announcement: WO2013/150847 WO 20131010
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/10 ; H01J37/26

Abstract:
Aiming for easily carrying out an energy discrimination or an angle discrimination of a secondary particle emitted from a sample or easily setting an optimal observation condition, a charged particle beam apparatus is provided with a charged particle source for emitting a charged particle beam, a lens for focusing the charged particle beam to a sample, a detector for detecting a secondary particle emitted from the sample, and an orbit simulator for calculating a position at which the secondary particle emitted from the sample arrives; and in this structure, the orbit simulator calculates an orbit of a secondary particle that satisfies a predetermined condition, and a sample image is formed by using a signal detected at a position where the secondary particle satisfying the predetermined condition arrives at the detector.
Public/Granted literature
- US20150083910A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2015-03-26
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