Invention Grant
- Patent Title: Method for producing gas barrier film, gas barrier film, and electronic device
- Patent Title (中): 阻气膜,阻气膜和电子装置的制造方法
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Application No.: US13976238Application Date: 2011-12-07
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Publication No.: US09362524B2Publication Date: 2016-06-07
- Inventor: Takahiro Mori
- Applicant: Takahiro Mori
- Applicant Address: JP Tokyo
- Assignee: KONICA MINOLTA, INC.
- Current Assignee: KONICA MINOLTA, INC.
- Current Assignee Address: JP Tokyo
- Agency: Lucas & Mercanti, LLP
- Priority: JP2010-289189 20101227
- International Application: PCT/JP2011/078327 WO 20111207
- International Announcement: WO2012/090665 WO 20120705
- Main IPC: B05D1/00
- IPC: B05D1/00 ; H01L51/52 ; C23C16/02 ; C23C16/40 ; C23C16/50 ; C23C16/54

Abstract:
An object of the present invention is to provide a method for producing a gas barrier film, capable of producing a gas barrier film which has production suitability in a roll-to-roll manner and is excellent in productivity and in gas barrier performance. The method for producing a gas barrier film including: a coating step for coating a first barrier layer formed on a base with a coating liquid containing a polysilazane compound to form a coating film; and an ultraviolet ray irradiation step for irradiation with a vacuum ultraviolet ray by light sources to form a second barrier layer, wherein an illuminance of the vacuum ultraviolet ray received on a coating film surface by the coating film from start to end of the irradiation with the vacuum ultraviolet ray is 160 mW/cm2 or less, there is a period T during which an illuminance of the vacuum ultraviolet ray on the coating film surface is 50 mW/cm2 or more and 160 mW/cm2 or less, and an amount of energy (E1) received on the coating film surface within T is 180 mJ/cm2 or more and 1800 mJ/cm2 or less.
Public/Granted literature
- US20130316182A1 METHOD FOR PRODUCING GAS BARRIER FILM, GAS BARRIER FILM, AND ELECTRONIC DEVICE Public/Granted day:2013-11-28
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