Invention Grant
- Patent Title: Method for removing foreign substances in charged particle beam device, and charged particle beam device
- Patent Title (中): 带电粒子束装置中除去异物的方法和带电粒子束装置
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Application No.: US14433886Application Date: 2013-10-17
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Publication No.: US09368319B2Publication Date: 2016-06-14
- Inventor: Kazuma Tanii , Yuji Kasai , Masakazu Takahashi , Hajime Kawano
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2012-230432 20121018
- International Application: PCT/JP2013/078186 WO 20131017
- International Announcement: WO2014/061738 WO 20140424
- Main IPC: G01N23/225
- IPC: G01N23/225 ; G01N21/956 ; H01J37/16 ; H01J37/244 ; H01J37/141 ; H01J37/28 ; H01J37/21

Abstract:
Foreign substances present in a sample chamber are attached to or drawn close to an objective lens and an electrode disposed close to the objective lens by applying a higher magnetic field than when normally used to the objective lens and applying a higher electric field than when normally used to the electrode disposed close to the objective lens. A stage is moved such that the center of an optical axis is located directly above a dedicated stand capable of applying voltage, the magnetic field of the objective lens is turned off, and then the potential difference between the electrode disposed close to the objective lens and an electrode disposed close to the sage is periodically maximized and minimized to thereby forcibly drop the foreign substances onto the dedicated stand capable of applying voltage.
Public/Granted literature
- US20150279609A1 Method for Removing Foreign Substances in Charged Particle Beam Device, and Charged Particle Beam Device Public/Granted day:2015-10-01
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