Invention Grant
- Patent Title: Absorbing excess under-fill flow with a solder trench
- Patent Title (中): 用焊料槽吸收多余的填充不足
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Application No.: US13722603Application Date: 2012-12-20
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Publication No.: US09368422B2Publication Date: 2016-06-14
- Inventor: Leilei Zhang , Ron Boja , Abraham F. Yee , Zuhair Bokharey
- Applicant: NVIDIA CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: NVIDIA Corporation
- Current Assignee: NVIDIA Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Artegis Law Group, LLP
- Main IPC: H01L23/12
- IPC: H01L23/12 ; H01L23/48 ; H01L29/40 ; H01L23/31 ; H01L23/00 ; H01L21/56

Abstract:
One embodiment sets forth an integrated circuit package that includes a substrate, one or more devices mounted on the substrate, a layer of under-fill configured to secure the one or more devices on the substrate, and a solder trench formed in the substrate, where the aggregate volume of the solder trench is large enough to capture a flow of excess under-fill during fabrication. One advantage of the disclosed integrated circuit package is that the solder trench is used in lieu of solder dam structures, thereby allowing a stencil to be lowered closer to the substrate surface during fabrication, which facilitates depositing solder paste during fabrication.
Public/Granted literature
- US20140175681A1 ABSORBING EXCESS UNDER-FILL FLOW WITH A SOLDER TRENCH Public/Granted day:2014-06-26
Information query
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