Invention Grant
US09372398B2 Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
有权
使用三嵌段或多嵌段共聚物的嵌段共聚物的定向组装中的图案化
- Patent Title: Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
- Patent Title (中): 使用三嵌段或多嵌段共聚物的嵌段共聚物的定向组装中的图案化
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Application No.: US13543667Application Date: 2012-07-06
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Publication No.: US09372398B2Publication Date: 2016-06-21
- Inventor: Paul Franklin Nealey , Shengxiang Ji
- Applicant: Paul Franklin Nealey , Shengxiang Ji
- Applicant Address: US WI Madison
- Assignee: Wisconsin Alumni Research Foundation
- Current Assignee: Wisconsin Alumni Research Foundation
- Current Assignee Address: US WI Madison
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: B32B27/28
- IPC: B32B27/28 ; B32B33/00 ; B05D3/10 ; G03F7/00 ; B81C1/00
Abstract:
Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.
Public/Granted literature
- US20130230705A1 PATTERNING IN THE DIRECTED ASSEMBLY OF BLOCK COPOLYMERS USING TRIBLOCK OR MULTIBLOCK COPOLYMERS Public/Granted day:2013-09-05
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