Invention Grant
- Patent Title: Electron beam writing apparatus and output control method
- Patent Title (中): 电子束写入装置和输出控制方法
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Application No.: US14936861Application Date: 2015-11-10
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Publication No.: US09384939B2Publication Date: 2016-07-05
- Inventor: Kennosuke Itagaki , Takiji Ishimura , Hiroyoshi Ando
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-230488 20141113
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/317

Abstract:
An output control method according to an embodiment is to control an output by a deflection amplifier that outputs a voltage signal to a deflection electrode of an electron beam writing apparatus. The voltage signal is proportional to input data, and the method includes: performing, for the voltage signal generated by synthesizing respective outputs by a plurality of D/A converters to which a control range of the voltage signal is assigned, the respective outputs by the plurality of D/A converters being proportional to respective inputs, sampling on at least either a lower limit value of the voltage signal within the control range or an upper limit value thereof; and generating a correction value to correct the output by the D/A converter based on the sampling result.
Public/Granted literature
- US20160141143A1 ELECTRON BEAM WRITING APPARATUS AND OUTPUT CONTROL METHOD Public/Granted day:2016-05-19
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