Invention Grant
- Patent Title: Ion generating apparatus and method of removing a fluorine compound deposited in a source housing thereof
- Patent Title (中): 离子发生装置和除去沉积在其源壳体中的氟化合物的方法
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Application No.: US12807852Application Date: 2010-09-15
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Publication No.: US09384943B2Publication Date: 2016-07-05
- Inventor: Kiyohiro Tsuru
- Applicant: Kiyohiro Tsuru
- Applicant Address: JP
- Assignee: SII Semiconductor Corporation
- Current Assignee: SII Semiconductor Corporation
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2009-216241 20090917
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/317

Abstract:
Provided is an ion generating apparatus. The ion generating apparatus includes opposed electrodes connected to a high-frequency power supply, and hence, even in a case where a cathode filament is broken, hydride gas can be ionized to generate hydrogen ion. Thus, a fluorine compound deposited in a source housing is reduced in vacuum, and gas containing fluorine generated due to the above-mentioned reduction reaction is discharged with a vacuum pump.
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