Invention Grant
- Patent Title: Stage system and a lithographic apparatus
- Patent Title (中): 舞台系统和光刻设备
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Application No.: US13686854Application Date: 2012-11-27
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Publication No.: US09389518B2Publication Date: 2016-07-12
- Inventor: Antonius Franciscus Johannes De Groot , Raymond Wilhelmus Louis Lafarre , Yang-Shan Huang , Sander Christiaan Broers , Peter Laurentius Maria Ros
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03B27/58

Abstract:
A movable stage system is configured to support an object. The stage system comprises an object table configured to support the object and an object table support defining an object table support surface configured to support the object table. The object table support comprises at least one first actuator to drive the object table support in a first driving direction substantially parallel to the object table support surface. In a projection on a plane parallel to the object table support surface the at least one actuator is spaced with respect to the object table in a direction perpendicular to the first driving direction such that the risk on slip between the object table support and the object table supported thereon is decreased.
Public/Granted literature
- US20130162968A1 Stage System and a Lithographic Apparatus Public/Granted day:2013-06-27
Information query
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