Invention Grant
- Patent Title: Methods and systems for lithography process window simulation
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Application No.: US14013593Application Date: 2013-08-29
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Publication No.: US09390206B2Publication Date: 2016-07-12
- Inventor: Jun Ye , Yu Cao , Hanying Feng
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/20

Abstract:
A method of efficient simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process.
Public/Granted literature
- US20140005998A1 METHODS AND SYSTEMS FOR LITHOGRAPHY PROCESS WINDOW SIMULATION Public/Granted day:2014-01-02
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