Invention Grant
- Patent Title: Deposition apparatus and deposition method
- Patent Title (中): 沉积设备和沉积方法
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Application No.: US13751282Application Date: 2013-01-28
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Publication No.: US09399819B2Publication Date: 2016-07-26
- Inventor: Hyun-Kyu Cho
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP HOLDINGS B.V.
- Current Assignee: ASM IP HOLDINGS B.V.
- Current Assignee Address: NL Almere
- Agency: Lex IP Meister, PLLC
- Priority: KR10-2012-0008739 20120130
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C23C16/455 ; H01J37/32
Abstract:
A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reactors; a plurality of gas supply units connected to the plurality of reactors; and a plurality of plasma supply units connected to the plurality of reactors. Each of the plasma supply units includes: a plasma power supplier; a plurality of diodes connected to the plasma power supplier; and a reverse voltage driver connected to the plurality of diodes through respectively corresponding switches.
Public/Granted literature
- US20130196080A1 DEPOSITION APPARATUS AND DEPOSITION METHOD Public/Granted day:2013-08-01
Information query
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